Iglasi ene-AR Coating eyenziwe ngokwezifiso

Ukwaleka kwe-AR, eyaziwa ngokuba yi-low-reflection coating, yinkqubo ekhethekileyo yonyango kumphezulu weglasi. Umgaqo kukwenza ukucubungula okumacala omabini okanye amacala amabini kumphezulu weglasi ukuze kube nokukhanya okuphantsi kuneglasi eqhelekileyo, kunye nokunciphisa ukukhanya okungaphantsi kwe-1%. Isiphumo sokuphazamiseka esiveliswa ziilayers ezahlukeneyo zezinto ezibonakalayo sisetyenziselwa ukususa ukukhanya okukhawulezileyo kunye nokukhanya okubonakalisiweyo, ngaloo ndlela kuphuculwe ukuhanjiswa.

Iglasi ye-ARIsetyenziswa kakhulu kwizikrini zokukhusela izixhobo zokubonisa ezifana neeTV zeLCD, iiTV zePDP, iilaptops, iikhompyutha zedesktop, izikrini zokubonisa zangaphandle, iikhamera, iglasi yefestile yekhitshi yokubonisa, iiphaneli zokubonisa zomkhosi kunye nezinye iiglasi ezisebenzayo.

Iindlela zokugquma ezisetyenziswa rhoqo zahlulwe zibe ziinkqubo ze-PVD okanye ze-CVD.

I-PVD: Ukufakwa koMphunga oPhilayo (i-PVD), okwaziwa ngokuba yiteknoloji yokufakwa komphunga ophilisayo, yiteknoloji yokulungiselela uphahla oluncinci olusebenzisa iindlela ezibonakalayo ukukhawuleza nokuqokelela izinto kumphezulu wento phantsi kweemeko zokucoca. Le teknoloji yokucoca yahlulwe ngokubanzi kwiindidi ezintathu: uphahla lwe-vacuum sputtering, uphahla lwe-vacuum ion, kunye nophahla lwe-vacuum evaporation. Ingahlangabezana neemfuno zophahla lwe-substrates eziquka iiplastiki, iglasi, iintsimbi, iifilimu, iiseramikhi, njl.njl.

I-CVD: Ukufuma komphunga wekhemikhali (i-CVD) kukwabizwa ngokuba yi-chemical vapor deposition, okubhekiselele kwi-gas phase reaction kubushushu obuphezulu, ukubola kobushushu bee-metal halides, ii-organic metals, ii-hydrocarbons, njl.njl., ukunciphisa i-hydrogen okanye indlela yokubangela ukuba igesi yayo exutyiweyo isabela ngokwekhemikhali kubushushu obuphezulu ukuze ibangele izinto ezingaphiliyo ezifana neemetal, ii-oxides, kunye nee-carbides. Isetyenziswa kakhulu kwimveliso yezinto ezimelana nobushushu, ii-high-purity metals, kunye neefilimu ezincinci ze-semiconductor.

Ulwakhiwo lokwaleka:

A. IGLASS\TIO2\SIO2 enecala elinye (umaleko ophindwe kabini)

B. I-AR enamacala amabini (eneeleya ezine) i-SIO2\TIO2\GLASS\TIO2\SIO2

C. I-AR enamaleko amaninzi (ukwenziwa ngokwezifiso ngokweemfuno zabathengi)

D. Udluliselo lunyuswa ukusuka kwi-88% yeglasi eqhelekileyo ukuya kwi-95% (ukuya kuthi ga kwi-99.5%, nto leyo enxulumene nobukhulu kunye nokukhethwa kwezinto).

E. Ukukhanya kweglasi eqhelekileyo kuncitshisiwe ukusuka kwi-8% ukuya ngaphantsi kwe-2% (ukuya kuthi ga kwi-0.2%), nto leyo enciphisa ngempumelelo isiphene sokuba mhlophe umfanekiso ngenxa yokukhanya okunamandla okuvela ngasemva, kwaye ukonwabele umgangatho womfanekiso ocacileyo.

F. Ukuhanjiswa kwe-ultraviolet spectrum

G. Ukumelana okuhle kakhulu nokukrwela, ubulukhuni >= 7H

H. Ukumelana okugqwesileyo kokusingqongileyo, emva kokuxhathisa i-asidi, ukumelana ne-alkali, ukumelana nesinyibilikisi, umjikelo wobushushu, ubushushu obuphezulu kunye nezinye iimvavanyo, umaleko wokugquma awunazo utshintsho olucacileyo

I. Iinkcukacha zokucubungula: 1200mm x1700mm ubukhulu: 1.1mm-12mm

Uthumelo luyaphuculwa, luhlala lukwi-spectrum ebonakalayo. Ukongeza kwi-380-780nm, iSaida Glass Company inokwenza ngokwezifiso uthumelo oluphezulu kwi-Ultraviolet range kunye nothumelo oluphezulu kwi-Infrared range ukuhlangabezana neemfuno zakho ezahlukeneyo. Wamkelekile kuthumela imibuzoukuze impendulo ikhawuleze.